Online ISSN: 2788-6867

Keywords : Physical properties


Study of the Effect of Laser Energy on the Structural and Optical Properties of TiO2 NPs Prepared by PLAL Technique

Israa F. Hasan; Khawla S. Khashan; Aseel A. Hadi

Journal of Applied Sciences and Nanotechnology, 2022, Volume 2, Issue 1, Pages 11-19
DOI: 10.53293/jasn.2021.3600.1031

Titanium dioxide nanoparticles were produced in this work by laser ablation of a high purity titanium objective immersed in distilled water. Optical and structural properties of the obtained TiO2 NPs using a Q-switched Nd: YAG laser of 1064nm wavelength with different laser energy (80, 100, 120, 140, and 160) mJ at 100 pulses was studied. The produced TiO2 NPs were characterized employing UV-VIS Spectrophotometer, X-ray diffraction, and scanning electron microscopy (SEM). The obtained TiO2NPs showed a decrease in transmittance in the region of the UV spectrum and an increase in the visible spectrum region. The estimated optical band gap of the TiO2NPs was 3.89eV, 3.8eV, and 3.70eV at 80, 120 and 160mJ laser energy, respectively. The as-produced TiO2NPs appear to be a Brookite crystalline phase with the preferential orientation along (200) direction. The scanning electron microscopy assays showed that the TiO2 NPs have a cauliflower shape. Results show that with increasing the energy of laser pulse, the size of nanoparticles was increased noticeably. Where the particle size and its morphology are affected by laser energy.

Study and Investigation of the Effects of the OTA Technique on the Physical Properties of the ZnO Thin Films Prepared by PLD

Duha S. Hassan; Mehdi Zayer

Journal of Applied Sciences and Nanotechnology, 2021, Volume 1, Issue 4, Pages 32-43
DOI: 10.53293/jasn.2021.3805.1045

The polycrystalline thin films were deposited on glass substrate at room temperature by pulsed laser deposition PLD technique. The effects of annealing treatment by used the Oil Thermal Annealing (OTA) process on the structural, optical and electrical properties of ZnO thin film films were investigated. The film structure was investigated by X-ray diffraction to indicate that the heat treatment after the OTA process gives the optimized condition of crystalline. The transmission spectrum of the film was measured by UV-V is spectrophotometer, and the Urbach energy and forbidden band width were calculated. The surface topography of the film was observed by scanning electron microscopy (SEM) image of the ZnO thin film at the OTA process shows the changes in the shape and size of the grains. The atomic force microscopy (AFM) effect of heat treatment was demonstrated by the change in the surface roughness of the ZnO thin film. The electrical properties of thin film were optioned by Hall Effect technique. That these improvements in the ZnO thin film physical properties were annealing temperatures by OTA at 150 °C, 200 °C, 250 °C and 300 °C.